lens aberration meaning in Chinese

透镜像差
透镜象差

The basics of lithography process , as well as the basic structure of lithographic system and the basic theory of partially coherent imaging are introduced in this paper . a bi - linear model of optical imaging is also presented . based on these theories , the simulation process of csplat is particularly analyzed , especially the computation of tccs ( transmission cross coefficient ) under different illuminations and the processing of primary lens aberrations inside tcc computation process
本文从光刻基本过程入手，介绍了光刻机光学系统的基本组成、部分相干光透射成像的基本原理，提出了光学系统的双线性模型，并在此基础上详细分析了仿真软件splat的仿真过程，其中着重分析了光学系统的传输交叉系数tcc的计算，包括不同照明系统下tcc的计算以及tcc计算中像差的处理。
Depends on the analysis of characteristics of excimer laser and the projection objective , a high multiple lens is designed , which is optimized by the professional software zemax , and then used in the accurate micro - machining . the system eliminate the lens aberration perfectly , and meet the requirement of machining at the precision of several microns
分析了目前主要的几种投影物镜系统特点,从光学设计理论出发,由专业光学设计软件zemax优化,设计加工了用于高精度准分子激光微孔加工的倍率为100 : 1的投影成像物镜。